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Theory and Fabrication of Integrated Circuits
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ece444 Mask Set

The ece444 mask set contains approximately 19,000 structures on a 100mm Si wafer. Approximately 10,000 are electronic devices and ~9,000 are test patterns.

Examples of the devices fabricated:

  • PMOSFETs
  • NMOSFETs
  • MOS Capacitors
  • pn Diodes
  • BJTs
  • Resistors

The current mask set is based on the work of Kevin Tsurutome (1991), Ron Stack (1994), and Dane Sievers (1998).

LASI was used for the layout of the mask and printed using the e-beam lithography system located in the Micro and Nanotechnology Lab.

Master Files

The current ece444 mask set (for use on 100mm Ultratech steppers) and older 1994 mask set (for 2" contact aligner) CAD files are available as zipped tlc or GDSII files.

LASI TLC Format

GDSII Format

CleWin gds file reader

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Mask Levels

Level 1

Level 2

Level 3

Level 4

Level 5

Wafer Layout

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Department of Electrical and Computer Engineering
College of Engineering
University of Illinois Urbana-Champaign

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