UIUC ECE Title Bar ece444
Theory and Fabrication of Integrated Circuits University of Illinois at Urbana-Champaign logo

HOME · LECTURE · LAB · GT · CALCULATORS · Text Only

LAB HOME · SAFETY · CLASS TIMES · DEVICES · EQUIPMENT · MANUALS

Lab photo

The ece444 laboratory contains a full array of silicon processing tools.

As a result of years of teaching excellence, the laboratory has acquired a full array of equipment, including:

• Step and repeat projection aligners
• High temperature furnaces
• Evaporators
• Wet etching hoods
• an extensive array of metrology tools
• Electrical test benches

Logsheets The process traveler for student wafers.

ece444 Maskset The working maskset for the ece444 process.

Information for testing the devices processed in ece444.

IC Process

1. RCA clean

2. Initial oxidation

3. Mask 1

4. Mask 1 etch

5. Mask 1 PR removal

6. Boron predep

7. BSG etch

8. Boron drive

9. Mask 2

10. Mask 2 etch

11. Mask 2 PR removal

12. Phosphorus predep

13. PSG Etch

14. Mask 3

15. Mask 3 etch

16. Mask 3 removal

17. Gate oxidation

18. Mask 4

19. Mask 4 etch

20. Mask 4 removal

21. Mask 5

22. Evaporation

23. Lift off

24. Anneal

Answers provided by this service may not be relevant to the materials presented in this website.

Department of Electrical and Computer Engineering
College of Engineering
University of Illinois Urbana-Champaign

Contact ece444
Copyright © 2007, 2008, 2009, 2010, 2011, 2012 The Board of Trustees at the University of Illinois. All rights reserved.

archives: ©1999   ©2000   ©2004   ©2005   ©2006