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GT15 · Ion Implantation Effective Range Data
P in Si P in SiO2 B in Si B in SiO2 Energy (kEv) Rp ΔRp Rp ΔRp Rp ΔRp Rp ΔRp 10 0.0139 0.0069 0.0108 0.0048 0.0333 0.0171 0.0298 0.0143
20 0.0253 0.0119 0.0199 0.0084 0.0662 0.0283 0.0622 0.0252
30 0.0368 0.0166 0.0292 0.0119 0.0987 0.0371 0.0954 0.0342
40 0.0486 0.0212 0.0388 0.0152 0.1302 0.0443 0.1283 0.0418
50 0.0607 0.0256 0.0486 0.0185 0.1608 0.0504 0.1606 0.0483
60 0.0730 0.0298 0.0586 0.0216 0.1903 0.0556 0.1921 0.0540
70 0.0855 0.0340 0.0688 0.0247 0.2188 0.0601 0.2228 0.0590
80 0.0981 0.0380 0.0792 0.0276 0.2465 0.0641 0.2528 0.0634
90 0.1109 0.0418 0.0896 0.0305 0.2733 0.0677 0.2819 0.0674
100 0.1238 0.0456 0.1002 0.0333 0.2994 0.0710 0.3104 0.0710
110 0.1367 0.0492 0.1108 0.0360 0.3248 0.0739 0.3382 0.0743
120 0.1497 0.0528 0.1215 0.0387 0.3496 0.0766 0.3653 0.0774
130 0.1627 0.0562 0.132 0.0412 0.3737 0.0790 0.3919 0.0801
140 0.1727 0.0595 0.1429 0.0437 0.3974 0.0813 0.4179 0.0827
150 0.1888 0.0628 0.1537 0.0461 0.4205 0.0834 0.4434 0.0851
*Rp and ΔRp in μm
*After Gibbons, Johnson, and Mylroie, Projected Range Statistics, 2nd. Ed., Dowden, Hutchison, and Ross, Inc.
Graphs and Tables
GT15 · Ion Implant Ranges
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