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Devices Fabricated in the ece444 Lab

ECE444 navigable mask

• U of I Logo
• Process control structures
• Contact chains, TLM resistors, Kelvin structures
• Bipolar Junction Transistors
• pMOS FETs
• nMOS FETs
• Load Inverter
• Miscellaneous FETs
• Capacitors
• pn Junction Diodes
• Resistance Structures
• Logic Circuits
• Electrical Misalignment structures

Devices

BJTs

Capacitors

Contact Resistance

Control Structures

Diodes

Inverters

Integrated Circuit Cells

Logo

Misalignment Structures

Miscellaneous FETs

nMOSFETs

pMOSFETs

Resistors

Device Cell

LASI was used for mask layout.

The mask set is currently under revision 1998: Dane Sievers, which is a minor redesign of revision 1994: Ron Stack. All revisions are based on the work of revision 1991: Kevin Tsurutome.

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Department of Electrical and Computer Engineering
College of Engineering
University of Illinois Urbana-Champaign

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